United States

We will discuss our use of ZnO nanoparticle-based thin films synthesized and grown at room temperature and deposited via electrophoretic deposition (EPD) onto p-doped silicon substrates.  Our experimentation plan includes using scanning electron microscopy to assess surface morphology and current-voltage characterization of ZnO/p-Si heterojunctions to study device performance potential.

EIPBN 2021

Study of Electrophoretic Deposition of ZnO Nanoparticles onto Silicon Substrates and Testing Performance of ZnO/p-Si

n-zno/p-si heterojunction

characterization

pn jumction based on zno nps

electrophoretic deposition

deposition system

zno nanoparticles

nanomaterials

fabrication

After two years of virtual conferences, we're excited to host EMC 2022 in person at The Ohio State University in Columbus, Ohio. In addition to cutting-edge technical presentations given in multiple parallel sessions, opportunities to network with colleagues will be present throughout the conference. The size and format of the meeting makes networking easy, whether you have been coming to the conference for many years or are a first-time attendee.

EMC is coordinated with the Device Research Conference (DRC), which will be held the same week, from June 26-29. This recognizes the strong interaction between device and electronic materials research and provides fruitful exchange of information between attendees of both Conferences.

For information on the 80th Device Research Conference, please visit the DRC 2022 website.



EMC 2022

The Electronic Materials Conference (EMC) is the premier annual forum on the preparation, characterization and use of electronic materials. This year’s event will feature a plenary session, topical sessions, a poster session and more.

poster

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

To register for this event, please follow the link below.

The goal of this work is to build compartmentalized microelectrode arrays to assess the impact of conditioned cell culture media exchange between two initially isolated neuronal networks. The fabrication of biocompatible dual-chamber microelectrode arrays is presented, including the manufacturing and attachment of resin rings with controllable openings for fluid exchange.

A dual-chamber microelectrode array to facilitate neuronal network communication

Width/depth and shape of volume of resist modified by ion beam as function of ion energy, exposure time and ion mass (He, Ne, Ar, Ga, Kr, Xe и Rn) is investigated by Monte-Carlo simulation. Sub-10nm resolution is found and confirmed. Analytical interpolating expressions for arbitrary ion mass, energy are submitted

 Ion beam lithography: resist modification volume determination and sub-10nm resolution prediction via simulation

In spite of M-C simulation shows strong dependence proximity function on depth (3D-PF)  it is possible to find effective α, β, η parameters for two-dimensional PF using original algorithm which considers development. Good agreement with experimental data is demonstrated thus proximity parameters now can be calculated for arbitrary layered material

PRESENTATION OF PROXIMITY FUNCTION BY THREE PARAMETERS , , BASED ON MONTE CARLO METHOD AND COMPARISON WITH EXPERIMENT

PMMA exposure sensitivity to both electrons and gallium ions at identical conditions was measured. It was found that a positive sensitivity to gallium ions is 1000 times higher than to electrons, all at the same conditions. Original procedure allowed to measure ion contrast (~3) for highly nonuniform in depth exposure

 Ion beam lithography: sensitivity/contrast in IBL vs EBL.

Our group used cellphone CMOS camera module, based on OV5648-BSI image sensor, to image 200keV electron beam in Transmission Electron Microscope and 30keV ion beam in Helium Ion Microscope.

Cellphone CMOS Camera Module for Imaging with Charged Particle Beams.

This work presents an improvement in the chemical and mechanical stability of a nanofluidic device formed in poly(ethylene glycol) diacrylate (PEGDA), a PEGbased UV resin for UV-NIL, by adding a cross-linking agent.

Surface Charge Density of Nanofluidic Devices with TMPTA UV Resins of Different Cross-Linking Agent Concentration Fabricated by UV Nanoimprint Lithography

This article provide a method about controlled exfoliation of 2D Bi2Se3 via nano-imprint. which could improve the yield and electrical performance. 2D Bi2Se3 with improved performance holds great promise for innovative photoelectric and thermoelectric applications.

Exfoliation of Two-dimensional Bismuth Selenide Based on Nanoimprint Lithography

Resonances in most of the metasurfaces are strongly depends on the geometry of the dielectric nanostructures and requires costly high-precision nanofabrication techniques. So we propose a robust structural symmetry-breaking silicon metasurface with ultra-narrow transparency.

Ultra-narrow Linewidth Symmetry-breaking Silicon Metasurface for Trace Biomolecules Sensing

we report the use of localized surface plasmon resonance (LSPR) sensor for real-time, label-free monitoring the adhering process of C. albicans onto the gold nanopillar array.  We also employ this sensor feature to elucidate how C. albicans’ adhesion is affected by different electrical properties of the material surface.

Replicate Nanopillar Arrays by Soft Lithography for Real-time Biosensing of C. Albicans Adhesion

We present the fabrication of ion sliced lithium niobate on oxidized silicon for integrated optics. Using structural modeling to optimize wafer thicknesses and a bonding apparatus to match wafer bows, an 817 nm thick lithium niobate film on oxidized silicon is achieved over a centimeter scale area.

Premium content

Study of Electrophoretic Deposition of ZnO Nanoparticles onto Silicon Substrates and Testing Performance of ZnO/p-Si

Downloads

Next from EIPBN 2021

A dual-chamber microelectrode array to facilitate neuronal network communication

Similar lecture

Characterization of β-Phase MgGaO Thin Films Grown by Molecular Beam Epitaxy