United States

Molybdenum disulfide, as  a transition metal dichalcogenide, has attracted huge attention for its good optical properties. However, to produce corresponding arrays of nano/microscale devices, resist-based lithography and etching generate permanent contaminations and damages. Here, we report a  method capable of generating arbitrary MoS2 patterns without additional lithography or etching processes.

EIPBN 2021

Multiplexing Rubbing-Induced Site-Selective (RISS) Method for Manufacturing MoS2 Device Arrays

lithography-free

site selective growth

molybdenum disulfide

The 15th Joint MMM-INTERMAG Conference (2022 Joint) is sponsored jointly by AIP Publishing and the IEEE Magnetics Society. Members of the international scientific and engineering communities interested in recent developments in fundamental and applied magnetism are invited to attend and contribute to the technical sessions. The technical program will include invited and contributed papers in oral and poster sessions, invited symposia, a plenary session, and an evening session, with about 1500 presentations overall. This Conference provides an outstanding opportunity for worldwide participants to meet their colleagues and collaborators and discuss developments in all areas of magnetism research.

The 2022 Joint Conference will offer both in-person and prerecorded on-demand content.

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Please register for the Joint MMM-Intermag conference to join the event.

2022 Joint MMM-INTERMAG

This Conference provides an outstanding opportunity for worldwide participants to meet their colleagues and collaborators and discuss developments in all areas of magnetism research.

technical paper

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

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Organic soft materials, such as gels are materials of choice for a vast number of biomedical applications such as tissue engineering, soft robotics, biosensing, drug delivery, implantable electronics, etc. Here we report on in-liquid direct write technique for 3D-sculpturing of hydrogels using focused electron and X-ray beams.

Electron and X-ray Beam Direct Write Lithography in Liquids: a Step Toward 3D Nanoprinting of Soft Materials

High aspect ratio nanostructuring requires high precision pattern transfer with highly directional etching. In this work, we demonstrate the fabrication of structures with unprecedented ultra-high aspect ratios up to 10’000:1 in the nanoscale regime (down to 10 nm) by metal assisted chemical etching (MacEtch) of silicon in gas phase.

Nanofabrication by Metal Assisted Chemical Etching of Silicon in Gas Phase

In this paper we report a series of breakthroughs that led to replication of gratings with a slant angle up to 60° and an aspect ratio of 10:1 in a material with refractive index of 1.90 (RI). A study of the replication process and materials optimization will be presented.

Nanoimprint process to mass manufacture highly-angled high-RI gratings for augmented reality combiners

Sequential vapor infiltration (SVI) with trimethylaluminum into UV-cured films visualized the presence of internal layered structures with different Al distributions dependent on chemical structure of monomers. X-ray reflectivity measurements revealed that the mixing of monomers was a positive way to homogenize the Al distributions in UV-cured films.

Internal Layered Structures of UV-Cured Thin Films after Sequential Vapor Infiltration Analyzed by X-ray Reflectivity Measurements

Until now, no in-situ, non-destructive and accurate technology has been invented, which introduces huge difficulties into the superhydrophobic surfaces research and applications. We developed an optical technology to characterize the state of superhydrophobic surface.

Optical Metrology of Characterizing Superhydrophobic States on Patterned Substrates

In direct writing laser lithography, hybrid structures such as gratings on top of resist structures can be generated by combining thermal NIL with DWL lithography. At 120 °C, it is still possible to pattern the resist into at least 4 µm depth without degrading the photosensitive component.

Hybrid structures achieved by direct writing laser lithography - tuning the contrast and surface topography of grayscale photoresist with nanoimprint lithography

Colors produced from nanostructures of different geometries and materials in 2D and 3D made mostly using 3D printing with two-photon polymerization.

Nanostructured Colors from Colorless Materials

We investigated the combination of maskless UV lithography and 2PP (two-photon polymerization) on a standard photo-resist: SU-8. 2PP technology is known to be slow. The advantage of mixing the technologies becomes obvious when some elements of a design can be exposed faster using maskless UV lithography.

Hybrid 2D & 3D Lithography

In this work, we discuss the fabrication process for two types of low-index metalenses composed of air-spaced elements.  First, we discuss the fabrication of our recently demonstrated two element hybrid achromatic metalens (HAML)  that employs nanopillars. Second, we discuss a novel air-spaced, varifocal, metalens that employs nanoholes.

Achromatic and Varifocal Metalens Doublet Fabrication by Two-photon Lithography

We present 3D printed Hybrid metasurfaces that employ variable height (3D) phase plates, pillars, and holes that provide additional degrees of freedom beyond purely planar designs. These structures were 3D printed with two-photon lithography technique.

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Multiplexing Rubbing-Induced Site-Selective (RISS) Method for Manufacturing MoS2 Device Arrays

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Electron and X-ray Beam Direct Write Lithography in Liquids: a Step Toward 3D Nanoprinting of Soft Materials

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