United States

Wafer-scale fabrication was used to create STEM-compatible operando graphene devices that can be characterized during operation. The e-beam can be used to further alter the device design. We employ use of secondary electron e-beam induced current (SEEBIC) imaging to visualize device conductivity and examine device failure modes in extreme conditions.

EIPBN 2021

Toward atomic-scale e-beam fabrication: imaging and altering graphene-based devices

dopant insertion

seebic

graphene

atomic-scale fabrication

stem

machine learning

The aim of ESSCIRC and ESSDERC is to provide an annual European forum for the presentation and discussion of recent advances in solid-state devices and circuits.
The level of integration for system-on-chip design is rapidly increasing.

This is made available by advances in semiconductor technology. Therefore, more than ever before, a deeper interaction among technologists, device experts, IC designers, and system designers is necessary. ESSCIRC and ESSDERC are governed by a common Steering Committee and share Plenary Keynote Presentations and Joint Sessions bridging both device and circuit communities.

Highlights:
* 3 joint keynote presentations
* 3 keynote presentations ESSCIRC
* 3 keynote presentations ESSDERC
* Invited papers with overall coverage of all aspects of advanced devices and circuits
* Presentation of IEEE and ESSCIRC/ESSDERC Awards
* Educational Events

JOINT PLENARY talks live broadcast: September 13, 2021 
ESSCIRC and ESSDERC KEYNOTE talks live broadcast: September 15, 2021 
LIVE Q&A INTERACTIVE sessions for all Conference Technical sessions: September 14 – 16 – 17, 2021 
LIVE Q&A INTERACTIVE sessions for all Educational Events: September 20-21-22, 2021 
(on demand videos available from September 6 until November 30, 2021)

**Please see here for the [ESSCIRC Guide](https://drive.google.com/file/d/10dghzuv4aQBty4QfTIY9Q8hXyqsue8Le/view?usp=sharing), [ESSDERC Guide](https://drive.google.com/file/d/10dx9y2tm9cHPDa4upNUYjfXCf44aPry5/view?usp=sharing), and the [Program at a Glance](https://drive.google.com/file/d/10eU0OLTXEpiNzI5hkqv4mSr43T8cedPP/view?usp=sharing)**

To access ESSCIRC ESSDERC 2021, you must pre-register for the conference.  Instructions on how to access the event will be provided directly to attendees and included on the ESSCIRC ESSDERC conference website. [Register now](https://www.esscirc-essderc2021.org/).

Please register for the ESSCIRC conference to join the event.

ESSCIRC ESSDERC 2021

The aim of ESSCIRC and ESSDERC is to provide an annual European forum for the presentation and discussion of recent advances in solid-state devices and circuits.
The level of integration for system-on-chip design is rapidly increasing.

This is made available by advances in semiconductor technology. Therefore, more than ever before, a deeper interaction among technologists, device experts, IC designers, and system designers is necessary. ESSCIRC and ESSDERC are governed by a common Steering Committee and share Plenary Keynote Presentations and Joint Sessions bridging both device and circuit communities.





technical paper

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

To register for this event, please follow the link below.

Electrochemical methods have stood out as the most promising since they can detect liquid-phase explosives. Moreover, they are simple, inexpensive, suitable for portable sensors, work at ambient conditions, and have high sensitivity and selectivity for nitro-compound.

Amperometric detection of nitro compounds using novel nanomaterial composite

In this work, a geometric model was developed using line-by-line assembly of non-monodispersed binary nanoparticles to obtain a randomly closed packed assembly structure. To validate the results from the script, a binary nanoparticle assembly was experimentally fabricated. The experimental and simulated FFT peak frequencies were compare.

Modeling Co-Assembly of Binary Non-Monodispersed Nanospheres

This talk will review applications of the Cs+ Low Temperature Ion Source (LoTIS). This ion source enables high precision FIB imaging and machining, and also high-yield secondary ion mass spectrometry (SIMS)

Applications of the Cesium Low Temperature Ion Source

After an introduction to the npSCOPE instrument and its capabilities we will introduce the new STIM detector and present first results obtained with it on single and polycrystalline samples as well biological specimen. The latter will focus on different kinds of nanoparticle samples relevant in the field of nano-toxicology.

 Scanning Transmission Ion Micrsocopy in the Helium Ion Microscope for nanoparticle research

Electrostatic lens system optimization is a challenge, especially for systems having many free variables with more than one objective function. An example is minimization of probe size for a primary beam, with in-lens secondary electron detection with maximum detection efficiency. This subject has been investigated here using Multi-Objective GA.

Probe Size and Detection Efficiency Optimization in Electrostatic Lens Systems Using Multi-Objective Genetic Algorithms

We describe two accessible and successful microfluidic strategies to expose human pluripotent stem cells to spatial gradients of differentiation-inducing extracellular signals in vitro. In addition, coupling with a fluorescent reporter and live-cell imaging allowed us to characterize the spatiotemporal dynamics of differentiation of our spatially patterned cell colonies.

Spatially controlled stem cell differentiation via morphogen gradients: comparing static and dynamic microfluidic platforms

In this study, we have employed lithography techniques to fabricate stretchable metallic micro-wiring with potential applications in flexible and stretchable electronics. The metal is deposited directly on top of the nano-fiber mesh, and it is patterned with photolithographic techniques to demonstrate stretchable micro-wiring.

Lithographically patterned flexible metallic micro wiring on an electrospun nano-fiber mesh

We demonstrate a novel fabrication process for creating ultra-thin (5+ nm) suspended membranes from a variety of ALD materials. ALD films as thin as 5 nm have been released without damage using a low-power O2 plasma. This flexible process is currently being validated through fabrication of conductive TiN TEM windows.

Fabrication of Ultra-Thin Suspended ALD Membranes

Hydrogen Depassivation Lithography has been used to place donors with atomic precision in buried Si (100) planes to make quantum and atomic electronic devices. Recent demonstrations using acceptors to pair with donors enable bipolar junction transistors. These 2D-nanodevices should be extremely high-performance, low-noise, rad-hard, and capable of cryogenic operation.

Progress Toward 2D Nano Bipolar Junction Transistors

We demonstrate the co-deposition of B and P in aligned atomic-scale patterns, in order to make bipolar junction devices. This requires the use of BCl3 and PH3 as acceptor and donor dopant precursors, and dI/dV imaging to relocate the B electrode and align the P electrodes to it.

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