VIDEO DOI: https://doi.org/10.48448/9zz6-9d72

technical paper

ESSCIRC ESSDERC 2021

September 14, 2021

Italy

Improvement on Ge/GeOx/Tm2O3/HfO2 Gate Performance by Forming Gas Anneal

Please log in to leave a comment

Downloads

SlidesPaperTranscript English (automatic)

Next from ESSCIRC ESSDERC 2021

A 55-63 GHz Fundamental Quad-Core VCO with NMOS-Only Stacked Oscillator in 28 nm CMOS
technical paper

A 55-63 GHz Fundamental Quad-Core VCO with NMOS-Only Stacked Oscillator in 28 nm CMOS

ESSCIRC ESSDERC 2021

+2Giovanni MangravitiJan CraninckxSriram Balamurali
Sriram Balamurali and 4 other authors

14 September 2021

Similar lecture

Scaling Ferroelectric HZO Thickness for Low Power Ge MFS-FTJ Memories
technical paper

Scaling Ferroelectric HZO Thickness for Low Power Ge MFS-FTJ Memories

ESSCIRC ESSDERC 2021

+3Nikitas Siannas
Nikitas Siannas and 5 other authors

14 September 2021